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21 July 2000 Novel interferometer to measure the figure of ashperical mirrors as used in EUV lithography
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Abstract
A visible light interferometer to measure the figure of aspherical mirrors, as used in extreme-ultraviolet lithography, will be presented. Except for two fiber tips to generate the reference and object wavefronts, it contains no auxiliary optics. The phase difference is measured using frequency modulation and heterodyne techniques. The figure is computed from the phase difference. We determined the specifications for the two-dimensional detector array, with which the phase difference is measured, and computed the position accuracy of the optical components. The resolution of the frequency modulation system should be 0.3 micrometer and the accuracy of the heterodyne technique should be 0.1 nm.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Rene G. Klaver and Joseph J. M. Braat "Novel interferometer to measure the figure of ashperical mirrors as used in EUV lithography", Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); https://doi.org/10.1117/12.390119
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