Recent advances of three-aspherical-mirror system for EUVL

Hiroo Kinoshita; Takeo Watanabe; Yanqiu Li; Atsushi Miyafuji; Tetsuya Oshino; Katsumi Sugisaki; Katsuhiko Murakami; Shigeo Irie; Shigeru Shirayone; Shinji Okazaki

doi:10.1117/12.390091

21 July 2000 Recent advances of three-aspherical-mirror system for EUVL

Hiroo Kinoshita, Takeo Watanabe, Yanqiu Li, Atsushi Miyafuji, Tetsuya Oshino, Katsumi Sugisaki, Katsuhiko Murakami, Shigeo Irie, Shigeru Shirayone, Shinji Okazaki

Author Affiliations +

Proceedings Volume 3997, Emerging Lithographic Technologies IV; (2000) https://doi.org/10.1117/12.390091
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

A three-aspherical-mirror system for Extreme Ultraviolet Lithography has been developed. The aspherical mirrors were fabricated using the computer controlled optical surfacing (CCOS) process and a phase shift interferometer. The mirrors have a figure error of 0.58 nm and surface roughness of 0.3 nm. In order to obtain a high efficiency mirror, M1 and M2 were coated with a graded d-spacing Mo/Si multilayer and mirror M3 was coated with a uniform d-spacing Mo/Si multilayer. The peak reflectivity is 65% at the wavelength of 13.5 nm. The wavelength matching of each mirror spans 0.45 nm. The mirrors were aligned with a Fizeau-type phase shift interferometer, and a final wavefront error of less than 3 nm was achieved. Exposure experiments carried out at new Subaru synchrotron facility revealed that this system is capable of replicating a 56 nm pattern in a 10 mm X 1 mm exposure field.

Citation Download Citation

Hiroo Kinoshita, Takeo Watanabe, Yanqiu Li, Atsushi Miyafuji, Tetsuya Oshino, Katsumi Sugisaki, Katsuhiko Murakami, Shigeo Irie, Shigeru Shirayone, and Shinji Okazaki "Recent advances of three-aspherical-mirror system for EUVL", Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); https://doi.org/10.1117/12.390091

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