Chemically amplified resists based on norbornene polymer with 2-trimethylsilyl-2-propyl ester protecting group

Jin-Baek Kim; Jae-Jun Lee; Jae-Sung Kang

doi:10.1117/12.388271

23 June 2000 Chemically amplified resists based on norbornene polymer with 2-trimethylsilyl-2-propyl ester protecting group

Jin-Baek Kim, Jae-Jun Lee, Jae-Sung Kang

Author Affiliations +

Proceedings Volume 3999, Advances in Resist Technology and Processing XVII; (2000) https://doi.org/10.1117/12.388271
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

New silicon-containing polymers, poly{5-[(2- trimethylsilyl-2-propyl)oxycarbonyl]-norbornene-co-maleic anhydride} [poly(TMSPN-co-MA)] and poly{5- [(2-trimethylsilyl-2-propyl)oxycarbonyl]-norbornene-co- maleic anhydride-co-2-tri-methylsilyl-2-propyl methacrylate}, were synthesized for dually developable chemically amplified resists. The polymers exhibited relatively good transmittances at 193 nm and have good thermal stability up to 190 degrees Celsius. Poly(TMSPN-co-MA) was evaluated as a resist for ArF excimer laser lithography. 0.18 micrometer line and space patterns were obtained at a dose of 11 mJ/cm² using the conventional wet developer with an ArF excimer laser stepper. 1 micrometer line and space patterns were obtained using dry development process with O₂ reactive ion etching.

Citation Download Citation

Jin-Baek Kim, Jae-Jun Lee, and Jae-Sung Kang "Chemically amplified resists based on norbornene polymer with 2-trimethylsilyl-2-propyl ester protecting group", Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); https://doi.org/10.1117/12.388271

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