Comparison of acrylate and methacrylate resin system in ArF lithography

Yasunori Uetani; Hiroaki Fujishima

doi:10.1117/12.388260

23 June 2000 Comparison of acrylate and methacrylate resin system in ArF lithography

Yasunori Uetani, Hiroaki Fujishima

Proceedings Volume 3999, Advances in Resist Technology and Processing XVII; (2000) https://doi.org/10.1117/12.388260
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

Using 2MAdMA(2-Metyl-2-Adamantylmethacrylate), 2MAdAA(2-Metyl- 2-Adamantylacrylate), GBLMA((gamma) -butyrolactone methacrylate), GBLAA((gamma) -butyrolactone acrylate) monomers, 4 types of copolymers, 2MAdMA/GBLMA, 2MAdMA/GBLAA, 2MAdAA/GBLMA, 2MAdAA/GBLAA resins were prepared. The same PAG formulation was applied to these resins to make ArF resist samples. Resolution capability, dry-etching resistance were evaluated. From the result, it can be concluded that 2MAdAA/GBLMA resin system has the best balance in dry etching resistance, resolution and sensitivity.

Citation Download Citation

Yasunori Uetani and Hiroaki Fujishima "Comparison of acrylate and methacrylate resin system in ArF lithography", Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); https://doi.org/10.1117/12.388260

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