Pattern transfer of sub-100-nm features in polysilicon using a single-layer photoresist and extreme ultraviolet lithography

Gregory Frank Cardinale

doi:10.1117/12.388325

23 June 2000 Pattern transfer of sub-100-nm features in polysilicon using a single-layer photoresist and extreme ultraviolet lithography

Gregory Frank Cardinale

Author Affiliations +

Proceedings Volume 3999, Advances in Resist Technology and Processing XVII; (2000) https://doi.org/10.1117/12.388325
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

Until recently, pattern transfer of 100 nm-scale features using extreme ultraviolet lithography (EUVL) was accomplished by using an intermediate hard mask material such as silicon oxide or silicon oxynitride. In this experiment, a single layer of deep-UV photoresist, 175 nm thick, was patterned using Sandia's 10x-Microstepper EUV imaging system. The pattern was subsequently transferred into an underlying polysilicon layer, 300 nm thick, using a reactive ion etch process. Cross-sectional and top-down scanning electron microscopy analysis was performed to evaluate the etch process and determine sidewall angle and the etch selectivity between polysilicon and the photoresist, and were found to be > 85 degrees and approximately 5:1, respectively.

Citation Download Citation

Gregory Frank Cardinale "Pattern transfer of sub-100-nm features in polysilicon using a single-layer photoresist and extreme ultraviolet lithography", Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); https://doi.org/10.1117/12.388325

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available