Thermal acid generator (TAG) synthesis variables and their effect on resist performance

Joseph E. Oberlander; Stan F. Wanat; Douglas S. McKenzie; Elaine Kokinda

doi:10.1117/12.388351

23 June 2000 Thermal acid generator (TAG) synthesis variables and their effect on resist performance

Joseph E. Oberlander, Stan F. Wanat, Douglas S. McKenzie, Elaine Kokinda

Proceedings Volume 3999, Advances in Resist Technology and Processing XVII; (2000) https://doi.org/10.1117/12.388351
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

With the development of acid catalyzed resist coatings, there is a need to better understand the TAG synthetic chemistry as it relates to performance of the final formulation. Earlier studies have correlated chemical structure to the rate of thermal decomposition. However, very little work has been done in looking at the synthetic chemistry as it relates to resist coatings and functional performance. During this study, both iodonium salts and sulfonate esters were studied. We have looked at how the TAG residual acid level impacts the functional properties of photoresist coatings. The results show that residual acid levels can significantly affect photospeed, cross linking, and thermal properties but have little or no effect on resolution and focus latitude.

Citation Download Citation

Joseph E. Oberlander, Stan F. Wanat, Douglas S. McKenzie, and Elaine Kokinda "Thermal acid generator (TAG) synthesis variables and their effect on resist performance", Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); https://doi.org/10.1117/12.388351

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