Factors affecting pitch bias in lithography simulation

Stewart A. Robertson; Edward K. Pavelchek; Catherine I. Swible-Keane; John F. Bohland; Michael T. Reilly

doi:10.1117/12.389067

5 July 2000 Factors affecting pitch bias in lithography simulation

Stewart A. Robertson, Edward K. Pavelchek, Catherine I. Swible-Keane, John F. Bohland, Michael T. Reilly

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.389067
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

The ability of a commercial lithography simulator to accurately predict the pitch dependent print bias of a conventional i-line resist is investigated, under conventional and annular illumination schemes for two critical geometries. The influence of the simulator settings and resist modeling parameters on the observed bias are determined. The result reveal that the simulation predictions are qualitatively, but not quantitatively, reflective of experimental data and are remarkably insensitive to changes in either the simulator settings or the parameters used to describe the resist process.

Citation Download Citation

Stewart A. Robertson, Edward K. Pavelchek, Catherine I. Swible-Keane, John F. Bohland, and Michael T. Reilly "Factors affecting pitch bias in lithography simulation", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.389067

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