Half-lambda imaging with KrF: performance challenges and trade-offs as expected through simulation

Steve D. Slonaker

doi:10.1117/12.389000

5 July 2000 Half-lambda imaging with KrF: performance challenges and trade-offs as expected through simulation

Steve D. Slonaker

Author Affiliations +

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.389000
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

As interferometry becomes readily and regularly available from the lithography projection lens testing process, the question to lithographers becomes, what can it tell us. The absence of a reliable and robust resist simulation treatment for chemically amplified resists leaves us searching for other ways to utilize the lens test interferometry data to help learn about the failure mechanisms associated with KrF imaging. Various simulation exercises and methods will be explored in the resolution regime near half-lambda, with the goal of identifying metrics which can be used to highlight imaging response optima as well as failure tendencies.

Citation Download Citation

Steve D. Slonaker "Half-lambda imaging with KrF: performance challenges and trade-offs as expected through simulation", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.389000

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