Highly durable low CoO mass production version of 2-kHz ArF excimer laser for DUV lithography

Tatsuo Enami; Osamu Wakabayashi; Ken Ishii; Katsutomo Terashima; Yasuo Itakura; Takayuki Watanabe; Takeshi Ohta; Ayako Ohbu; Hirokazu Kubo; Hirokazu Tanaka; Toru Suzuki; Akira Sumitani; Hakaru Mizoguchi

doi:10.1117/12.388981

5 July 2000 Highly durable low CoO mass production version of 2-kHz ArF excimer laser for DUV lithography

Tatsuo Enami, Osamu Wakabayashi, Ken Ishii, Katsutomo Terashima, Yasuo Itakura, Takayuki Watanabe, Takeshi Ohta, Ayako Ohbu, Hirokazu Kubo, Hirokazu Tanaka, Toru Suzuki, Akira Sumitani, Hakaru Mizoguchi

Author Affiliations +

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.388981
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

We have succeeded in the commercialization of the world's first kHz ArF excimer laser for microlithography application. The ArF laser is expected to be the light source for the DUV lithography tools for sub-0.13 micron geometry semiconductor production. In this paper, we present the performance and advanced technologies of the newest model of the ArF excimer laser, which achieves 10W of output power with 0.5 pm bandwidth at 2 kHz. The pulse-to-pulse energy stability, 3 sigma is less than 10 percent and integrated energy stability is within +/- 0.3 percent. The durability performance is extended to 5 billion pulses, which provides affordable CoO for volume production.

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Tatsuo Enami, Osamu Wakabayashi, Ken Ishii, Katsutomo Terashima, Yasuo Itakura, Takayuki Watanabe, Takeshi Ohta, Ayako Ohbu, Hirokazu Kubo, Hirokazu Tanaka, Toru Suzuki, Akira Sumitani, and Hakaru Mizoguchi "Highly durable low CoO mass production version of 2-kHz ArF excimer laser for DUV lithography", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.388981

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