Integration of attenuated phase-shift mask to 0.13-um technology contact level masking process

Lay Cheng Choo; O'Seo Park; Michael J. Sack; Siu Chung Tam

doi:10.1117/12.388956

5 July 2000 Integration of attenuated phase-shift mask to 0.13-μm technology contact level masking process

Lay Cheng Choo, O'Seo Park, Michael J. Sack, Siu Chung Tam

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.388956
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

The attenuated phase shift mask has been sued to delineate 0.22 micrometers contact hole structures for 0.18micrometers technology. Using a scanner with a high NA of 0.68, this is equivalent to a k₁ value of 0.60. As device shrinks down to 0.13 micrometers technology, 0.16 micrometers contact holes are to be printed with sufficient process latitudes. Using the existing high NA scanner, the k₁ value is a low 0.44. Simulations were done using PROLITH/3D software, and the results show better performance for isolated holes. Higher mask transmissions are required to improve the aerial image of the dense holes. Experimentation was conducted to print 0.16micrometers contact holes using moderate and low (sigma) settings. 6 percent APSM was used with 0.16micrometers , 0.18micrometers and 0.20micrometers contact hole patterns biased by 0.04micrometers , 0.06micrometers and 0.08micrometers . Impact of these parameters on mask error enhancement factor were discussed.

Citation Download Citation

Lay Cheng Choo, O'Seo Park, Michael J. Sack, and Siu Chung Tam "Integration of attenuated phase-shift mask to 0.13-μm technology contact level masking process", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.388956

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