Modified proximity function for OPC in laser direct writing

Jinglei Du; Fuhua Gao; Yixiao Zhang; Yongkang Guo; Chunlei Du; Zheng Cui

doi:10.1117/12.388940

5 July 2000 Modified proximity function for OPC in laser direct writing

Jinglei Du, Fuhua Gao, Yixiao Zhang, Yongkang Guo, Chunlei Du, Zheng Cui

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.388940
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

Based on the energy conservation law, a modified proximity function is proposed to describe the absorbed energy distribution in photoresist during laser writing. The measured data for photoresist absorbing energy are fitted well to the modified proximity function. We analyze the proximity effect in laser writing by using the new model, it is helpful to further develop the precompensation and multi- exposure methods to correct proximity effects in laser direct writing.

Citation Download Citation

Jinglei Du, Fuhua Gao, Yixiao Zhang, Yongkang Guo, Chunlei Du, and Zheng Cui "Modified proximity function for OPC in laser direct writing", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.388940

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