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5 July 2000 Properties and potential of VUV lithographic thin film materials
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Abstract
Before 157nm optical lithography can be implemented as an effective technology, the performance of VUV thin film materials must be investigated. These materials will have a significant impact on the ultimate system performance. The capability of such films may actually determine whether an optical technology is viable. We have been exploring the optical properties of various fluorides, oxides and nitrides for use at 157nm. We have developed several approaches for solutions to optical coatings, masking and AR applications. These include an alternative version of a chromium absorber film, optical and AR coatings based on Group III metal fluorides.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michael J. Cangemi, Matthew Lassiter, Anatoly Bourov, and Bruce W. Smith "Properties and potential of VUV lithographic thin film materials", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.388995
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