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5 July 2000 Prospects for very high repetition rate lasers for microlithography
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Abstract
The demand of high throughput and good energy dose stability of DUV scanner systems result in the requirement of laser repetition rates above 2 kHz for lithography production tools at 193 nm and 157 nm. Also in 248 nm lithography, dose energy stability could be improved by higher repetition rates from the laser. We have investigated the possibilities and limits of high repetition rate performance of laser discharge units for DUV lithography lasers. A new chamber has been developed with electrode configuration, pre- ionization system and high speed gas flow system for very high repetition rate operation. Acoustic resonances in the frequency range of interest have been prevented by design. With new solid-state pulsed power modules which support long pulse gain modulation and high precision high voltage power supplies very high repetition rates have been demonstrated. For 248 nm lasers repetition rates above 5 kHz have been achieved, for 193 nm laser above 4.5 kHz. 157 nm lasers can be operated above 2.5 kHz. Data of the laser performance as e.g. power and energy stability are given for the various wavelengths.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Igor Bragin, Vadim Berger, Rainer Paetzel, Uwe Stamm, Andreas Targsdorf, Juergen Kleinschmidt, and Dirk Basting "Prospects for very high repetition rate lasers for microlithography", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.389003
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