Simpler attenuated phase-shifting mask

Jin Zhang; Boru Feng; Desheng Hou; Chongxi Zhou; HanMin Yao; Yongkang Guo; Fen Chen; Fang Sun; Ping Su

doi:10.1117/12.388954

5 July 2000 Simpler attenuated phase-shifting mask

Jin Zhang, Boru Feng, Desheng Hou, Chongxi Zhou, HanMin Yao, Yongkang Guo, Fen Chen, Fang Sun, Ping Su

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.388954
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

The structure, principle and manufacturing process of a single layer attenuated phase-shifting mask which is compatible with the traditional Cr mask fabrication technology are introduced in the paper. Partial experimental results are provided.

Citation Download Citation

Jin Zhang, Boru Feng, Desheng Hou, Chongxi Zhou, HanMin Yao, Yongkang Guo, Fen Chen, Fang Sun, and Ping Su "Simpler attenuated phase-shifting mask", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.388954

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