Translator Disclaimer
5 July 2000 Ultranarrow-bandwidth excimer lasers for 248-nm DUV lithography
Author Affiliations +
We have developed a KrF excimer laser with ultra narrow linewidth and high repetition rate applicable for optical lithography using DUV wafer scanners with highest numerical aperture (NA) of more than 0.8. A laser bandwidth of less than 0.4 pm, full width half maximum, is achieved by our new design of the laser resonator, which is based on out patented polarization coupled resonator. The new resonator design increase the efficiency of ht laser optics and improves the wavelength stability. The laser tube and solid sate pulser have been adapted to the new laser resonator. As a result, another step in the reduction of the cost of operation is achieved. The laser operates with a repetition rate of 2 kHz and gives a large operation range with respect to wavelength and energy range. The characteristic performance of this new excimer laser is presented.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Rainer Paetzel, Hans Stephen Albrecht, Vadim Berger, Igor Bragin, Matthias Kramer, Juergen Kleinschmidt, and Marcus Serwazi "Ultranarrow-bandwidth excimer lasers for 248-nm DUV lithography", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000);


Excimer laser for 157-nm lithography
Proceedings of SPIE (June 25 1999)
High-power 193-nm excimer lasers for DUV lithography
Proceedings of SPIE (September 14 2001)
ArF excimer laser for 193-nm lithography
Proceedings of SPIE (June 29 1998)

Back to Top