Translator Disclaimer
Paper
19 July 2000 Graphite membrane applied for high-aspect-ratio microstructure fabrication
Author Affiliations +
Proceedings Volume 4066, Photomask and Next-Generation Lithography Mask Technology VII; (2000) https://doi.org/10.1117/12.392053
Event: Photomask and Next Generation Lithography Mask Technology VII, 2000, Kanagawa, Japan
Abstract
X-ray mask is the most important component in the x-ray micromachining. Absorber patterns have to form onto a working mask, then patterns can be transferred into the substrate. Graphite membrane has characters of low atomic number, electrical conductor, and rigid body suitable for a support diaphragm in a working mask.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hsiharng Yang, Min-Chieh Chou, Horng-Jey Wang, Chengtang Pan, and Jiang Long Lin "Graphite membrane applied for high-aspect-ratio microstructure fabrication", Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); https://doi.org/10.1117/12.392053
PROCEEDINGS
7 PAGES


SHARE
Advertisement
Advertisement
Back to Top