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23 February 2000 Influence of cross-relaxation parameter on the sensitized photon avalanche
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Proceedings Volume 4068, SIOEL '99: Sixth Symposium on Optoelectronics; (2000) https://doi.org/10.1117/12.378671
Event: SIOEL: Sixth Symposium of Optoelectronics, 1999, Bucharest, Romania
Abstract
The paper discuses the influence of cross-relaxation parameter on the characteristics of the sensitized photon avalanche. A system Pr3+ as activator ion and Yb3+ as sensitizer ion were considered for the avalanche process. By numerical modelling of a system of rate equations, time dependencies and pump rate dependencies of populations of energy levels were calculated for three different values of cross-relaxation rate. Correlation between cross-relaxation rate and threshold value of pump intensity was established.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Eugen Osiac and Voicu Lupei "Influence of cross-relaxation parameter on the sensitized photon avalanche", Proc. SPIE 4068, SIOEL '99: Sixth Symposium on Optoelectronics, (23 February 2000); https://doi.org/10.1117/12.378671
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