Negative magnetoresistance of granular Co-Cu films prepared by electrochemical deposition

Vladimir M. Hutanu; Voicu Dolocan

doi:10.1117/12.378661

23 February 2000 Negative magnetoresistance of granular Co-Cu films prepared by electrochemical deposition

Vladimir M. Hutanu, Voicu Dolocan

Proceedings Volume 4068, SIOEL '99: Sixth Symposium on Optoelectronics; (2000) https://doi.org/10.1117/12.378661
Event: SIOEL: Sixth Symposium of Optoelectronics, 1999, Bucharest, Romania

Abstract

We have investigated the magnetoresistance and structure of binary metallic system formed by Cu and Co. The samples were prepared by electrochemical deposition from a single electrolyte acid solution on copper coated glass substrate. The structure of the alloy films before and after annealing has been determined by X-ray diffraction. Two cubic phase which could not be precise identified. Field dependence of the magnetoresistance were measured for different field orientations. Isotropic negative magnetoresistance effect of 2 percent at room temperature for Cu-Co structures before annealing and of 0.9 percent after annealing was found. The temperature dependence of resistivity was measured.

Citation Download Citation

Vladimir M. Hutanu and Voicu Dolocan "Negative magnetoresistance of granular Co-Cu films prepared by electrochemical deposition", Proc. SPIE 4068, SIOEL '99: Sixth Symposium on Optoelectronics, (23 February 2000); https://doi.org/10.1117/12.378661

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