Plasma-assisted pulsed laser deposition of titanium dioxide

V. A. Shakhatov; Alessandro De Giacomo; V. D'Onghia; Aurora M. Losacco; Giuseppe Chita; Giovanni Bruno; Olga De Pascale

doi:10.1117/12.378185

25 February 2000 Plasma-assisted pulsed laser deposition of titanium dioxide

V. A. Shakhatov, Alessandro De Giacomo, V. D'Onghia, Aurora M. Losacco, Giuseppe Chita, Giovanni Bruno, Olga De Pascale

Proceedings Volume 4070, ALT '99 International Conference on Advanced Laser Technologies; (2000) https://doi.org/10.1117/12.378185
Event: ALT'99 International Conference: Advanced Laser Technologies, 1999, Potenza-Lecce, Italy

Abstract

TiO₂ film deposition by PAPLD with biased substrates is investigated into a wide range of laser fluence and oxygen pressure. It is established that plasma of the r.f. discharge excited inside PLD chamber strongly affects the films properties. TiO₂ films deposited by PAPLD were found better than those produced by the conventional PLD with regard to their morphology, optical properties, and uniformity. So, at the high values of Knudsen number (lambda) /L < 1 with an r.f. power of 70 Watt, PAPLD markedly improves the TiO₂ film stoichiometry for high laser fluence, and the deposition rate increases with it up to 2 A/s.

Citation Download Citation

V. A. Shakhatov, Alessandro De Giacomo, V. D'Onghia, Aurora M. Losacco, Giuseppe Chita, Giovanni Bruno, and Olga De Pascale "Plasma-assisted pulsed laser deposition of titanium dioxide", Proc. SPIE 4070, ALT '99 International Conference on Advanced Laser Technologies, (25 February 2000); https://doi.org/10.1117/12.378185

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