Repetitively pulsed discharge plasma-controlled copper-vapor laser kinetics

Anatoly N. Soldatov; Andrey V. Lugovskoy; Yu. P. Polunin; A. A. Fofanov; L. N. Chausova

doi:10.1117/12.383444

24 April 2000 Repetitively pulsed discharge plasma-controlled copper-vapor laser kinetics

Anatoly N. Soldatov, Andrey V. Lugovskoy, Yu. P. Polunin, A. A. Fofanov, L. N. Chausova

Proceedings Volume 4071, International Conference on Atomic and Molecular Pulsed Lasers III; (2000) https://doi.org/10.1117/12.383444
Event: International Conference on Atomic and Molecular Pulsed Lasers III, 1999, Tomsk, Russian Federation

Abstract

We have developed and tested a technique for controlling copper-vapor laser output parameters by superimposing a secondary repetitively pulsed discharge on a primary discharge with a controlled time delay. As the time delay is varied from tens of microseconds to several microseconds, the output energy and average power can be varied from 0 to 100%. A lasing management mechanism based on prescribed variations in the microcharacteristics of the discharge plasma is discussed.

Citation Download Citation

Anatoly N. Soldatov, Andrey V. Lugovskoy, Yu. P. Polunin, A. A. Fofanov, and L. N. Chausova "Repetitively pulsed discharge plasma-controlled copper-vapor laser kinetics", Proc. SPIE 4071, International Conference on Atomic and Molecular Pulsed Lasers III, (24 April 2000); https://doi.org/10.1117/12.383444

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