Translator Disclaimer
1 September 2000 Microstructuring in LiNbO3: a route to MEMS devices in piezoelectric crystal media
Author Affiliations +
Proceedings Volume 4075, Micro-Opto-Electro-Mechanical Systems; (2000)
Event: Symposium on Applied Photonics, 2000, Glasgow, United Kingdom
Ferroelectric materials such as LiNbO3 and LiTaO3 offer many potential advantages over silicon for MEMS structures and self-actuating miniature devices. These materials possess numerous useful intrinsic properties such as piezoelectricity, pyroelectric and electro-optic coefficients, enabling the construction of micro-scale cantilevers, membranes, tips and switches. So far however, reliable and accurate methods for machining and microstructuring LiNbO3 single crystals have been lacking. We have recently been exploring several such methods, which are sensitive to ferroelectric domain orientation. A sample that has been domain-engineered shows a large difference in etch characteristics: the +z face does not etch at all, whereas the -z face etches normally. Microstructured devices can be fabricated therefore, via spatially selective domain poling followed by etching. The extreme sensitivity of the etch process to domain orientation has enabled us to fabricate ridge waveguides for electro-optic modulator applications, alignment grooves for efficient fibre pig-tailing to LiNbO3 modulators, and micro-cantilevers using a novel technique of contact bonding of dissimilar ferroelectric hosts.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Robert William Eason, Ian E. Barry, Graeme W. Ross, Peter G. R. Smith, and Corin B.E. Gawith "Microstructuring in LiNbO3: a route to MEMS devices in piezoelectric crystal media", Proc. SPIE 4075, Micro-Opto-Electro-Mechanical Systems, (1 September 2000);


Bend-size reduction on the SOI rib waveguide platform
Proceedings of SPIE (March 14 2013)
Angular alignment for wafer bonding
Proceedings of SPIE (September 23 1996)
Inductively coupled plasma etching of ZnO
Proceedings of SPIE (February 20 2007)
Amorphous Silicon As An Inorganic Resist
Proceedings of SPIE (June 18 1984)

Back to Top