Paper
29 November 2000 Characteristics of CdSe thin film transistor
Yumei Jing, Ruhua Ye, Zhiming Li, Jusheng Li
Author Affiliations +
Proceedings Volume 4086, Fourth International Conference on Thin Film Physics and Applications; (2000) https://doi.org/10.1117/12.408442
Event: 4th International Conference on Thin Film Physics and Applications, 2000, Shanghai, China
Abstract
Cadmium selenide thin film transistors were fabricated using normal evaporation and sputtering technique in multiple pumpdown of vacuum systems. The device structure, materials of each layer and deposition conditions are depicted. Characteristics of CdSe TFTs were studied. The results indicate that stable CdSe TFTs with good characteristics can be obtained by use of simple vacuum deposition processes and adding indium thin layer in the insulator/semiconductor interface.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yumei Jing, Ruhua Ye, Zhiming Li, and Jusheng Li "Characteristics of CdSe thin film transistor", Proc. SPIE 4086, Fourth International Conference on Thin Film Physics and Applications, (29 November 2000); https://doi.org/10.1117/12.408442
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KEYWORDS
Thin films

Semiconductors

Transistors

Annealing

Indium

Interfaces

Sputter deposition

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