Preparation and properties of scratch-resistant nanoporous broadband AR silica films derived by a two-step catalytic sol-gel process

Guangming Wu; Jue Wang; Shen Jun; Tianhe Yang; Qinyuan Zhang; Bin Zhou; Zhongsheng Deng; Bin Fan; Dongping Zhou; Fengshan Zhang

doi:10.1117/12.408386

29 November 2000 Preparation and properties of scratch-resistant nanoporous broadband AR silica films derived by a two-step catalytic sol-gel process

Guangming Wu, Jue Wang, Shen Jun, Tianhe Yang, Qinyuan Zhang, Bin Zhou, Zhongsheng Deng, Bin Fan, Dongping Zhou, Fengshan Zhang

Author Affiliations +

Proceedings Volume 4086, Fourth International Conference on Thin Film Physics and Applications; (2000) https://doi.org/10.1117/12.408386
Event: 4th International Conference on Thin Film Physics and Applications, 2000, Shanghai, China

Abstract

A new method to strengthen nano porous broadband anti- reflectance silica films is described. Silica sols were made from TEOS with a base/acid two-step catalytic process. Properties of silica films deposited with a dip-coat method are characterized with AFM, SEM, spectrophotometer and abrasion test. Experimental results show that an average reflectance of a glass coated with the nano porous silica films is less than 1% in the visible region; and that the two-step catalysis obviously strengthens the films. Finally, the strengthening mechanism of the films is discussed.

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Guangming Wu, Jue Wang, Shen Jun, Tianhe Yang, Qinyuan Zhang, Bin Zhou, Zhongsheng Deng, Bin Fan, Dongping Zhou, and Fengshan Zhang "Preparation and properties of scratch-resistant nanoporous broadband AR silica films derived by a two-step catalytic sol-gel process", Proc. SPIE 4086, Fourth International Conference on Thin Film Physics and Applications, (29 November 2000); https://doi.org/10.1117/12.408386

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