Simulation of nucleation and initial growth of thin films on metal surface

Fengmin Wu; Yuanchun Liu; Xiongwei Wang; Ziqin Wu

doi:10.1117/12.408466

29 November 2000 Simulation of nucleation and initial growth of thin films on metal surface

Fengmin Wu, Yuanchun Liu, Xiongwei Wang, Ziqin Wu

Proceedings Volume 4086, Fourth International Conference on Thin Film Physics and Applications; (2000) https://doi.org/10.1117/12.408466
Event: 4th International Conference on Thin Film Physics and Applications, 2000, Shanghai, China

Abstract

The atomic processes of nucleation and initial growth of thin films on metal surfaces are simulated by Monte Carlo method, using realistic growth model and physical parameters. The effects of adatoms evaporation from the substrate and diffusion along the edge of the islands are included in the simulation model. It is shown that the compact structure of Fe island grows on Fe(001) surface over the wide range of temperatures from 250 to 2000 K, which is consistent with the nucleation theory. The simulation results not only nicely reproduce the experiments of thin film growth at intermediate temperature, but also predict the growth situations of thin films at high temperature.

Citation Download Citation

Fengmin Wu, Yuanchun Liu, Xiongwei Wang, and Ziqin Wu "Simulation of nucleation and initial growth of thin films on metal surface", Proc. SPIE 4086, Fourth International Conference on Thin Film Physics and Applications, (29 November 2000); https://doi.org/10.1117/12.408466

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