Paper
29 November 2000 Substrate stress effect on phase transition properties of ferroelectric films from Landau theory
C. L. Wang, X. S. Wang, Y. Xin, W. L. Zhong, P. L. Zhang
Author Affiliations +
Proceedings Volume 4086, Fourth International Conference on Thin Film Physics and Applications; (2000) https://doi.org/10.1117/12.408360
Event: 4th International Conference on Thin Film Physics and Applications, 2000, Shanghai, China
Abstract
The influence of film/substrate stress on the phase transition property of ferroelectric thin films has been investigated from Landau theory. The stress is introduced through a coupling term of stress and polarization in the expression of free energy. The stress is assumed decreasing exponentially away from the substrate. Profiles and temperature dependence of polarization have been obtained for films with different strength of stress. The extensive stress reduces the polarization and shifts the Curie temperature to a low temperature; whilst the tensile stress enhances the polarization and shifts the Curie temperature to a high temperature, even higher than that of corresponding bulk Curie temperature if the tensile stress is strong enough.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
C. L. Wang, X. S. Wang, Y. Xin, W. L. Zhong, and P. L. Zhang "Substrate stress effect on phase transition properties of ferroelectric films from Landau theory", Proc. SPIE 4086, Fourth International Conference on Thin Film Physics and Applications, (29 November 2000); https://doi.org/10.1117/12.408360
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KEYWORDS
Polarization

Interfaces

Thin films

Distortion

Solids

Basic research

Microelectronics

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