Evaluation of characteristics of VUV optical materials irradiated by F2 laser

Yasuo Itakura; Fumika Yoshida; Youichi Kawasa; Akira Sumitani; Osamu Wakabayashi; Hakaru Mizoguchi

doi:10.1117/12.405748

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6 November 2000 Evaluation of characteristics of VUV optical materials irradiated by F₂ laser

Yasuo Itakura, Fumika Yoshida, Youichi Kawasa, Akira Sumitani, Osamu Wakabayashi, Hakaru Mizoguchi

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Proceedings Volume 4088, First International Symposium on Laser Precision Microfabrication; (2000) https://doi.org/10.1117/12.405748
Event: First International Symposium on Laser Precision Microfabrication (LPM2000), 2000, Omiya, Saitama, Japan

Abstract

The F₂ Laser (wavelength 157nm) is becoming the most promising candidate of light source for next generation optical micro-lithography below the 100nm-technology node. We have developed VUV optics evaluation system, which is able to measure the transmittance between DUV and VUV region right after laser irradiation and the temporal transmittance during 157nm-laser irradiation. This system structured by Ni-plated Aluminum and stainless steel. The inside of chamber is purged of any laser light absorption gas away with high purity nitrogen gas during the irradiation. Using this system, we can measure the characteristics of the irradiated sample without exposing to the air of other contamination sources. So this system has +/- 0.5% accuracy result in repeated measurement. In the in-situ transmittance measure system, the transmittance can be monitored during F₂ laser irradiation. And we evaluated characteristics of VUV optical materials in the early period of F₂ laser irradiation by this in-situ transmittance measure system.

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Yasuo Itakura, Fumika Yoshida, Youichi Kawasa, Akira Sumitani, Osamu Wakabayashi, and Hakaru Mizoguchi "Evaluation of characteristics of VUV optical materials irradiated by F₂ laser", Proc. SPIE 4088, First International Symposium on Laser Precision Microfabrication, (6 November 2000); https://doi.org/10.1117/12.405748

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