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2 November 2000 Advanced methods for surface and subsurface defect characterization of optical components
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Abstract
We discuss principles of optical surface quality assessment. The micro topography of well polished fused silica, CaF2 and Si surfaces was examined locally and by covering large sample areas. Power Spectral Densities (PSD) were used for consistent roughness description. Subsurface damage was detected by a modified white light interferometer technique and total scattering measurement.
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Joerg Steinert, Stefan Gliech, Andreas Wuttig, Angela Duparre, and Horst Truckenbrodt "Advanced methods for surface and subsurface defect characterization of optical components", Proc. SPIE 4099, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries, (2 November 2000); https://doi.org/10.1117/12.405829
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