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2 February 2001 Patterned dye diffusion using transferred photoresist for polymer OLED displays
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Abstract
A method of large-area dye diffusion for patterning the emissive color of organic light-emitting devices (OLEDs) using transferred photoresist is introduced. Using a large-area dye diffusion source, the dye is diffused into the emissive layer of the OLED. To locally pattern the emissive color, either a shadow mask or a patterned dye source has to be used. The implementation of both approaches using photolithographic patterning and transferred photoresist is outlined in this paper. In addition, a method using transferred photoresist for patterning of the cathode will be discussed.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Florian Pschenitzka and James C. Sturm "Patterned dye diffusion using transferred photoresist for polymer OLED displays", Proc. SPIE 4105, Organic Light-Emitting Materials and Devices IV, (2 February 2001); https://doi.org/10.1117/12.416876
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