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2 November 2000 Development of an EUV reflectometer using a laser plasma x-ray source
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Abstract
In order to evaluate the performance of multilayer optics, we have successfully developed a simple, laboratory-sized reflectometer that can be operated readily on a routine basis. This reflectometer makes use of a single line emission at the wavelength of 12.98 nm from a CO2 gas-jet laser-plasma x-ray source that can be readily operated on a routine basis. Our reflectometer achieved repeatability of less than +/- 0.8% in reflectivity measurements. The peak reflectivity of a sample determined by calculation based on multilayer mirror parameters obtained from our reflectometer was within +/- 1.3% of that obtained by an SR-based reflectometer. These results confirm that our reflectometer performs well enough to evaluate multilayer optics.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hiroyuki Kondo, Noriaki Kandaka, Katsumi Sugisaki, Tetsuya Oshino, Masayuki Shiraishi, Wakana Ishiyama, and Katsuhiko Murakami "Development of an EUV reflectometer using a laser plasma x-ray source", Proc. SPIE 4144, Advances in Laboratory-based X-Ray Sources and Optics, (2 November 2000); https://doi.org/10.1117/12.405906
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