Optimization of depth-graded multilayer designs for EUV and x-ray optics

Zhanshan Wang; Alan G. Michette

doi:10.1117/12.411644

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5 January 2001 Optimization of depth-graded multilayer designs for EUV and x-ray optics

Zhanshan Wang, Alan G. Michette

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Proceedings Volume 4145, Advances in X-Ray Optics; (2001) https://doi.org/10.1117/12.411644
Event: International Symposium on Optical Science and Technology, 2000, San Diego, CA, United States

Abstract

The optimization of the design of depth-graded multilayers with special angular or wavelength responses for use as coatings in EUV/X-ray optics is discussed in this presentation. The optimization is based on the well-known Fresnel equations and recursive calculation combined with a defined merit function, with random variation of the thickness of each layer. The optimization of depth-graded multilayers for various applications uses a process that judges a design based on its required performance in a given range of wavelength and/or incidence angle. The requirements could include many factors such as the spectral distribution of a source, the shape of the reflectivity curve or the geometry of the optical system. The key factor for optimization is to determine a suitable merit function for a specific application. This allows the design of multilayers for different requirements. The method has been used to give the thickness of each layer in some depth-graded multilayers with special requirements in optical properties.

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Zhanshan Wang and Alan G. Michette "Optimization of depth-graded multilayer designs for EUV and x-ray optics", Proc. SPIE 4145, Advances in X-Ray Optics, (5 January 2001); https://doi.org/10.1117/12.411644

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