Translator Disclaimer
5 January 2001 X-ray zone plate fabrication using a focused ion beam
Author Affiliations +
An x-ray zone plate was fabricated using the novel approach of focused ion beam (FIB) milling. The FIB technique was developed in recent years, it has been successfully used for transmission electron microscopy (TEM) sample preparation, lithographic mask repair, and failure analysis of semiconductor devices. During FIB milling, material is removed by the physical sputtering action of ion bombardment. The sputter yield is high enough to remove a substantial amount of material, therefore FIB can perform a direct patterning with submicron accuracy. We succeeded in fabricating an x-ray phase zone plate using the Micrion 9500HT FIB station, which as a 50 kV Ga+ column. Circular Fresnel zones were milled in a 1.0-micrometer-thick TaSiN film deposited on a silicon wafer. The outermost zone width of the zone plate is 170 nm at a radius of 60 micrometer. An achieved aspect ratio was 6:1.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Peter P. Ilinski, Barry P. Lai, Neil J. Bassom, Jason Donald, and Gregory J. Athas "X-ray zone plate fabrication using a focused ion beam", Proc. SPIE 4145, Advances in X-Ray Optics, (5 January 2001);


X-ray mask defect repair optimization
Proceedings of SPIE (June 25 1999)
SOR Lithography in West Germany
Proceedings of SPIE (August 01 1989)
Defect Repair Techniques For X-Ray Masks
Proceedings of SPIE (June 18 1984)
State of the art in focused ion beam mask repair...
Proceedings of SPIE (July 03 1995)
0.25-um x-ray mask repair with focused ion beams
Proceedings of SPIE (June 24 1993)

Back to Top