Translator Disclaimer
8 November 2000 DUV or EUV: that is the question
Author Affiliations +
Lord Rayleigh's well-known equations for resolution and depth of focus indicate that resolution is better improved by reducing the wavelength of light rather than by increasing the numerical aperture (NA) of the projection optics, particularly when NA is approaching its physical limit of 1.0 in air (or vacuum). Vector aerial image simulations of diffraction-limited Deep Ultraviolet (DUV) and Extreme Ultraviolet (EUV) lithographic systems verify this simple view, even though Rayleigh's constants in Microlithography are not constant because of a variety of image enhancement techniques that attempt to compensate for the shortcomings of the aerial image when it is pushed to the limit. The aerial image is not the whole story, however. The competition between DUV and EUV systems will be decided more by economic and technological factors such as risk, time and cost of development and cost of ownership. These in turn depend on cost, availability and quality of light sources, refracting materials, photoresists and reticles.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
David M. Williamson "DUV or EUV: that is the question", Proc. SPIE 4146, Soft X-Ray and EUV Imaging Systems, (8 November 2000);


Overview of extreme ultraviolet lithography
Proceedings of SPIE (December 07 1994)
System Design For A Dental Image Processing System
Proceedings of SPIE (December 16 1988)
Quality enhancement of image-intensified x-ray image
Proceedings of SPIE (February 19 1997)

Back to Top