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11 August 2000 Fabrication of graphite masks for deep and ultradeep x-ray lithography
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Proceedings Volume 4175, Materials and Device Characterization in Micromachining III; (2000) https://doi.org/10.1117/12.395599
Event: Micromachining and Microfabrication, 2000, Santa Clara, CA, United States
Abstract
Masks made from graphite stock material have been demonstrated as a cost-effective and reliable method of fabricating X-ray masks for deep and ultra-deep x-ray lithography (DXRL and UDXRL, respectively). The focus on this research effort was to fabricate masks that were compatible with the requirements for deep and ultra deep X-ray lithography by using UV optical lithography and gold electroforming. The major focus was on the uniform application of a thick resist on a porous graphite substrate. After patterning the resist, gold deposition was performed to build up the absorber structures using pulsed- electroplating. In this paper we will report on the current status of the mask fabrication process and present some preliminary exposure results.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yohannes M. Desta, Georg Aigeldinger, Kevin J. Zanca, Philip J. Coane, Jost Goettert, and Michael C. Murphy "Fabrication of graphite masks for deep and ultradeep x-ray lithography", Proc. SPIE 4175, Materials and Device Characterization in Micromachining III, (11 August 2000); https://doi.org/10.1117/12.395599
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