Microsystems for diverse applications using recently developed microfabrication techniques

Laurent Dellmann; Terunobu Akiyama; Danick Briand; Sebastien Gautsch; Olivier T. Guenat; Benedikt Guldimann; Philippe Luginbuhl; Cornel Marxer; Urs Staufer; Bart van der Schoot; Nico F. de Rooij

doi:10.1117/12.395608

11 August 2000 Microsystems for diverse applications using recently developed microfabrication techniques

Laurent Dellmann, Terunobu Akiyama, Danick Briand, Sebastien Gautsch, Olivier T. Guenat, Benedikt Guldimann, Philippe Luginbuhl, Cornel Marxer, Urs Staufer, Bart van der Schoot, Nico F. de Rooij

Author Affiliations +

Proceedings Volume 4175, Materials and Device Characterization in Micromachining III; (2000) https://doi.org/10.1117/12.395608
Event: Micromachining and Microfabrication, 2000, Santa Clara, CA, United States

Abstract

The continuous progress in micro- and nano-system technologies has allowed the successful development of many innovative products in process control, environmental monitoring, healthcare, automotive and aerospace as well as information processing systems. In this paper on overview will be given of current progress in micro- and nanofabrication process technologies, such as deep reactive ion etching, micro-electro discharge machining, thick photoresistant processing and plating. The availibility of these micro- and nanofabrication processes will be illustrated with examples of new generations of silicon-based sensors, actuators and Microsystems with a particular emphasis on real applications of these components and systems.

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Laurent Dellmann, Terunobu Akiyama, Danick Briand, Sebastien Gautsch, Olivier T. Guenat, Benedikt Guldimann, Philippe Luginbuhl, Cornel Marxer, Urs Staufer, Bart van der Schoot, and Nico F. de Rooij "Microsystems for diverse applications using recently developed microfabrication techniques", Proc. SPIE 4175, Materials and Device Characterization in Micromachining III, (11 August 2000); https://doi.org/10.1117/12.395608

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