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22 August 2000 Status of the development of a 128x128 microshutter array
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Proceedings Volume 4178, MOEMS and Miniaturized Systems; (2000)
Event: Micromachining and Microfabrication, 2000, Santa Clara, CA, United States
We are developing a lithography process for a 2D array of microshutters which can be used as a high efficiency, high contrast field selection device for a multi-objects spectrometer for the Next Generation Space Telescope. The device is a close- packed array of shutters with an individual shutter size of 100 micrometers square and area filling factor of about 80 percent, produced in a 100 micrometers thick silicon wafer. Our current array size is 128 by 128. Ech shutter made of silicon nitride with an appropriate optical coating, pivots on a torsion flexure along one edge. A CMOS circuit embedded in the frame around the shutters allows individual selection. An original double-shutter mechanism is employed for actuation. Processing includes anisotropic back etching for wafer thinning, a DRIE back etch through the silicon to the mechanical active nitride membrane and a RIE to produce the shutters out of the nitride membrane. Our layout is based on a detailed mechanical analysis for which we determined crucial material parameters experimentally.
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Samuel Harvey Moseley Jr., Rainer K. Fettig, Alexander S. Kutyrev, Mary J. Li, David Brent Mott, and Bruce E. Woodgate "Status of the development of a 128x128 microshutter array", Proc. SPIE 4178, MOEMS and Miniaturized Systems, (22 August 2000);


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