Benchmarking of advanced CD-SEMs against a new unified specification for sub-0.18-um lithography

Alain G. Deleporte; John A. Allgair; Charles N. Archie; G. William Banke Jr.; Michael T. Postek Jr.; Jerry E. Schlesinger; Andras E. Vladar; Arnold W. Yanof

doi:10.1117/12.395750

18 August 2000 Benchmarking of advanced CD-SEMs against a new unified specification for sub-0.18-μm lithography

Alain G. Deleporte, John A. Allgair, Charles N. Archie, G. William Banke Jr., Michael T. Postek Jr., Jerry E. Schlesinger, Andras E. Vladar, Arnold W. Yanof

Author Affiliations +

Proceedings Volume 4181, Challenges in Process Integration and Device Technology; (2000) https://doi.org/10.1117/12.395750
Event: Microelectronic Manufacturing, 2000, Santa Clara, CA, United States

Abstract

The AMAG comprised of representatives from International SEMATECH consortium member companies and the National Institute of Standards and Technology have joined to develop a new unified specification for an advanced scanning electron microscope critical dimension measurement instrument (CD-SEM). This paper describes the result of an effort to benchmark six CD-SEM instruments according to this specification.

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Alain G. Deleporte, John A. Allgair, Charles N. Archie, G. William Banke Jr., Michael T. Postek Jr., Jerry E. Schlesinger, Andras E. Vladar, and Arnold W. Yanof "Benchmarking of advanced CD-SEMs against a new unified specification for sub-0.18-μm lithography", Proc. SPIE 4181, Challenges in Process Integration and Device Technology, (18 August 2000); https://doi.org/10.1117/12.395750

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