Why single-machine processing overlay error still fails: reticle interference effect and our solution on IC foundry fab

H. M. Sheng; Chen-Cheng Kuoe; L. G. Terng; Dong S. Cheng; Yung H. Liao; Joseph Guo

doi:10.1117/12.410069

23 August 2000 Why single-machine processing overlay error still fails: reticle interference effect and our solution on IC foundry fab

H. M. Sheng, Chen-Cheng Kuoe, L. G. Terng, Dong S. Cheng, Yung H. Liao, Joseph Guo

Author Affiliations +

Proceedings Volume 4182, Process Control and Diagnostics; (2000) https://doi.org/10.1117/12.410069
Event: Microelectronic Manufacturing, 2000, Santa Clara, CA, United States

Abstract

Processing two consequent layers on the same exposure tool had long time been considered to be the terminated solution for overlay control by photolithography process engineers. Such measure would take advantage of excluding Lens distortion contribution to overlay performance and lead to only mask error, alignment accuracy, stage accuracy consume the overlay main budget. But in practice, large overlay error still could be observed even single machine run on scanner that could not be tolerable by current device requirement. How come. Reticle interference effect with alignment laser beam had been demonstrated to dominate such large overlay error contribution. Solutions to control and eliminate this effect on CI foundry fab were also presented. An advanced feedforward/feedback control system would compensate such error in advance. Also ARC coating on mask quartz side that would eliminate the interference effect will be mentioned and proved to be effective way for better overlay control performance.

Citation Download Citation

H. M. Sheng, Chen-Cheng Kuoe, L. G. Terng, Dong S. Cheng, Yung H. Liao, and Joseph Guo "Why single-machine processing overlay error still fails: reticle interference effect and our solution on IC foundry fab", Proc. SPIE 4182, Process Control and Diagnostics, (23 August 2000); https://doi.org/10.1117/12.410069

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KEYWORDS

Quartz

Reticles

Optical alignment

Coating

Overlay metrology

Scanners

Photomasks

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