Generation of nanosecond XeCl pulse trains

Olivier P. Uteza; Christophe Bonneville; Philippe Ch. Delaporte; Bernard L. Fontaine; Marc L. Sentis

doi:10.1117/12.414089

25 January 2001 Generation of nanosecond XeCl pulse trains

Olivier P. Uteza, Christophe Bonneville, Philippe Ch. Delaporte, Bernard L. Fontaine, Marc L. Sentis

Proceedings Volume 4184, XIII International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference; (2001) https://doi.org/10.1117/12.414089
Event: XIII International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, 2000, Florence, Italy

Abstract

High contrast nanosecond pulse trains are produced by an oscillatorÑamplifier XeCl laser system incorporating polarizing optics. The device is simple and flexible allowing to deliver nanosecond pulse trains up to 17 mJ and with adjustable characteristics mainly concerning the number ofpulses (2 to 6 pulses) and the individual pulse peak power (0.2Ñ2.3 MW).

Citation Download Citation

Olivier P. Uteza, Christophe Bonneville, Philippe Ch. Delaporte, Bernard L. Fontaine, and Marc L. Sentis "Generation of nanosecond XeCl pulse trains", Proc. SPIE 4184, XIII International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, (25 January 2001); https://doi.org/10.1117/12.414089

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