Paper
25 January 2001 High-peak-power CO2 planar waveguide lasers for direct high-resolution machining
Francisco J. Villarreal, Paul R. Murray, Howard J. Baker, Gavin A. J. Markillie, R. J. Ramirez, Quisheng Cao, Denis R. Hall
Author Affiliations +
Proceedings Volume 4184, XIII International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference; (2001) https://doi.org/10.1117/12.414064
Event: XIII International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, 2000, Florence, Italy
Abstract
The peak power and gain available from the RF excited planar waveguide CO2 laser has been enhanced for pulses in the 10 to 100 ?s range at pulse repetition rates up to 4 kHz. The specific peak power output for unit electrode area has been enhanced to a value of240 kW.m-2 . Relative to cw, the small signal gain coefficient has been pulse enhanced by a factor of 7 to 2.5 m-1
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Francisco J. Villarreal, Paul R. Murray, Howard J. Baker, Gavin A. J. Markillie, R. J. Ramirez, Quisheng Cao, and Denis R. Hall "High-peak-power CO2 planar waveguide lasers for direct high-resolution machining", Proc. SPIE 4184, XIII International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, (25 January 2001); https://doi.org/10.1117/12.414064
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KEYWORDS
Pulsed laser operation

Carbon dioxide lasers

Planar waveguides

Carbon dioxide

Continuous wave operation

Electrodes

Gas lasers

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