Characterization of Be-based multilayer masks using x-ray reflectivity and Auger electron spectroscopy

James R. Wasson; Pawitter J. S. Mangat; Jon M. Slaughter; Scott Daniel Hector; Sasa Bajt; Patrick A. Kearney

doi:10.1117/12.410748

22 January 2001 Characterization of Be-based multilayer masks using x-ray reflectivity and Auger electron spectroscopy

James R. Wasson, Pawitter J. S. Mangat, Jon M. Slaughter, Scott Daniel Hector, Sasa Bajt, Patrick A. Kearney

Author Affiliations +

Proceedings Volume 4186, 20th Annual BACUS Symposium on Photomask Technology; (2001) https://doi.org/10.1117/12.410748
Event: Photomask Technology, 2000, Monterey, CA, United States

Abstract

With the acceptance of AAPSM’s by most major semiconductor manufacturers, it is necessary to build a significant number of these masks in a cost effective and controlled manner. Optical methods of metrology used for many years in the photomask industry for binary masks are unsuitable for certain metrology applications related to AAPSM manufacture and repair. Recent work performed on a Dimension 9000M-PM automated atomic force microscope shows promise for both process control and defect review applications for AAPSM’s and overcome some of the limitations of optical and SEM based metrologies. AFM metrology is shown to be able to quantify shifter step heights and phase error for features as small as 100 nm. Further, these systems are able to read in defect coordinate maps and automatically drive to these sites and scan. The scanned data provides pixel-by-pixel height data that can be used by repair tools to establish the proper dose for defect ablation.

Citation Download Citation

James R. Wasson, Pawitter J. S. Mangat, Jon M. Slaughter, Scott Daniel Hector, Sasa Bajt, and Patrick A. Kearney "Characterization of Be-based multilayer masks using x-ray reflectivity and Auger electron spectroscopy", Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); https://doi.org/10.1117/12.410748

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE