Establishment of production process and assurance method for alternating phase-shift masks

Shiaki M. Murai; Yasuhiro Koizumi; Tatsuhiko Kamibayashi; Hidetaka Saitou; Morihisa Hoga; Yasutaka Morikawa; Hiroyuki Miyashita

doi:10.1117/12.410772

22 January 2001 Establishment of production process and assurance method for alternating phase-shift masks

Shiaki M. Murai, Yasuhiro Koizumi, Tatsuhiko Kamibayashi, Hidetaka Saitou, Morihisa Hoga, Yasutaka Morikawa, Hiroyuki Miyashita

Author Affiliations +

Proceedings Volume 4186, 20th Annual BACUS Symposium on Photomask Technology; (2001) https://doi.org/10.1117/12.410772
Event: Photomask Technology, 2000, Monterey, CA, United States

Abstract

Alternating phase shift masks (altPSMs) are effective in reducing MEF. However, altPSMs have been used in device development, not in production, because phase-defect assurance has not been sufficient. An assurance method for 180- and 150-nm rule altPSMs was established by the use of both MD-2000 and KLA/STARlight. We have started production of defect-free altPSMs with quartz etched shifters and single trench structures by a two-step quartz etching process, which has an advantage of low phase-defect density.

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Shiaki M. Murai, Yasuhiro Koizumi, Tatsuhiko Kamibayashi, Hidetaka Saitou, Morihisa Hoga, Yasutaka Morikawa, and Hiroyuki Miyashita "Establishment of production process and assurance method for alternating phase-shift masks", Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); https://doi.org/10.1117/12.410772

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