Improved throughput in 0.6-NA laser reticle writers

Gregory E. Valentin; Henry Chris Hamaker; Jay P. Daniel; Vishal Garg; Daniel R. Sprenkel

doi:10.1117/12.410724

22 January 2001 Improved throughput in 0.6-NA laser reticle writers

Gregory E. Valentin, Henry Chris Hamaker, Jay P. Daniel, Vishal Garg, Daniel R. Sprenkel

Author Affiliations +

Proceedings Volume 4186, 20th Annual BACUS Symposium on Photomask Technology; (2001) https://doi.org/10.1117/12.410724
Event: Photomask Technology, 2000, Monterey, CA, United States

Abstract

New writing strategies have been developed to meet the demand for high-volume mask manufacturing. The ALTA® 3000HT system enables users to meet their performance requirements at increased production capacity. The write time of an ALTA 3000HT mask writer has been observed to be substantially shorter than that of the ALTA 3000 system. The ability to change between eight and four averaging passes, as well as the addition of key hardware improvements, give users increased flexibility in meeting the throughput and print quality requirements for volume production mask manufacturing. Observed throughput and print performance data are presented.

Citation Download Citation

Gregory E. Valentin, Henry Chris Hamaker, Jay P. Daniel, Vishal Garg, and Daniel R. Sprenkel "Improved throughput in 0.6-NA laser reticle writers", Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); https://doi.org/10.1117/12.410724

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