Investigating inspectability and printability of contamination deposited during SEM analysis

Bryan S. Kasprowicz; Mohan Ananth; Chih-Yu Wang

doi:10.1117/12.410674

22 January 2001 Investigating inspectability and printability of contamination deposited during SEM analysis

Bryan S. Kasprowicz, Mohan Ananth, Chih-Yu Wang

Author Affiliations +

Proceedings Volume 4186, 20th Annual BACUS Symposium on Photomask Technology; (2001) https://doi.org/10.1117/12.410674
Event: Photomask Technology, 2000, Monterey, CA, United States

Abstract

The effects on pattern fidelity of material deposition on photomasks due to interactions of the primary electrons with the organic molecules contained in the vacuum chamber while being analyzed in CD SEM were investigated. The photomasks experienced contamination in the area that was electron-irradiated by the SEM, but it was not detected with either a transmitted or reflected light inspection. Wafers were exposed at various illumination conditions and at multiple wavelengths, which produced no noticeable effects on the images as compared to unanalyzed locations.

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Bryan S. Kasprowicz, Mohan Ananth, and Chih-Yu Wang "Investigating inspectability and printability of contamination deposited during SEM analysis", Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); https://doi.org/10.1117/12.410674

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