Laser resist screening for iP3500/3600 replacement for advanced reticle fabrication

Fumiko Ota; Hideo Kobayashi; Takao Higuchi; Keishi Asakawa

doi:10.1117/12.410737

22 January 2001 Laser resist screening for iP3500/3600 replacement for advanced reticle fabrication

Fumiko Ota, Hideo Kobayashi, Takao Higuchi, Keishi Asakawa

Author Affiliations +

Proceedings Volume 4186, 20th Annual BACUS Symposium on Photomask Technology; (2001) https://doi.org/10.1117/12.410737
Event: Photomask Technology, 2000, Monterey, CA, United States

Abstract

This paper will describe resist screening results for iP3500/3600 replacement for the advanced laser reticle fabrication, resist coating thickness optimization proposal for the next generation as well. THMR-M100 (TOK) showed the best pattern profile with sharp shoulders and almost with no footing, and a newly developed resist, a joint-work between HOYA and a resist maker, showed the best performance in adhesion to chrome. However, there was not the best selection found unfortunately by this screening, which exceeded iP3500 in linearity and iso-dense bias (IDB) that was indispensable one for the advanced laser reticle fabrication. As regards coating thickness, we selected 307.5 nm thick as a candidate for coating thickness standard for the future with considering resist resolution performance such as linearity, y p(0-80) value and undercut, in conjunction with a risk of clear pinhole defects. For more precise comparison of iso-dense bias (IDB) performance, it would be better that the examination method is standardized because of the design pattern dependence of IDB.

Citation Download Citation

Fumiko Ota, Hideo Kobayashi, Takao Higuchi, and Keishi Asakawa "Laser resist screening for iP3500/3600 replacement for advanced reticle fabrication", Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); https://doi.org/10.1117/12.410737

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