New approach to improve CD uniformity based on mask quality

Roman Liebe; Carmen Jaehnert; Gidon Gottlib; Yair Eran; Shirley Hemar; Amikam Sade; Anja Rosenbusch

doi:10.1117/12.410673

22 January 2001 New approach to improve CD uniformity based on mask quality

Roman Liebe, Carmen Jaehnert, Gidon Gottlib, Yair Eran, Shirley Hemar, Amikam Sade, Anja Rosenbusch

Author Affiliations +

Proceedings Volume 4186, 20th Annual BACUS Symposium on Photomask Technology; (2001) https://doi.org/10.1117/12.410673
Event: Photomask Technology, 2000, Monterey, CA, United States

Abstract

CD uniformity is one of the key discussion topics in the ramp-up process of new technologies. The impact of mask quality is getting more and more attention in this process. The paper presents improving wafer CD uniformity control by application of new reticle CD qualification procedure. The new procedure is based on combining conventional CD metrology and Linewidth Bias Monitor (LBM) as a standard part of mask inspection.

Citation Download Citation

Roman Liebe, Carmen Jaehnert, Gidon Gottlib, Yair Eran, Shirley Hemar, Amikam Sade, and Anja Rosenbusch "New approach to improve CD uniformity based on mask quality", Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); https://doi.org/10.1117/12.410673

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