SCALPEL mask parametric study

Gerald A. Dicks; Roxann L. Engelstad; Edward G. Lovell; James Alexander Liddle

doi:10.1117/12.410749

22 January 2001 SCALPEL mask parametric study

Gerald A. Dicks, Roxann L. Engelstad, Edward G. Lovell, James Alexander Liddle

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Proceedings Volume 4186, 20th Annual BACUS Symposium on Photomask Technology; (2001) https://doi.org/10.1117/12.410749
Event: Photomask Technology, 2000, Monterey, CA, United States

Abstract

Electron-beam projection lithography is a prime candidate for producing sub-100 nm linewidths. Critical to its success is the development of a low-distortion membrane mask. Membrane distortions are a result of fabrication and exposure and manifest themselves as pattern placement errors; thus, the sources of distortion must be identified, controlled, and minimized. Mechanical modeling via finite element (FE) methods provides an invaluable tool for accomplishing this task. Consequently, the FE method was used in conjunction with a series of designed experiments to efficiently identify and control the most influential parameters involved in the development of the Scattering with Angular Limitation Projection Electron-beam Lithography (SCALPEL) mask.

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Gerald A. Dicks, Roxann L. Engelstad, Edward G. Lovell, and James Alexander Liddle "SCALPEL mask parametric study", Proc. SPIE 4186, 20th Annual BACUS Symposium on Photomask Technology, (22 January 2001); https://doi.org/10.1117/12.410749

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