Optical emission diagnostics of glow discharge plasma for the carbon nitride growth process

Wei Yu; Shu-Fang Wang; Xiao-Wei Li; Lianshui Zhang; Guangsheng Fu

doi:10.1117/12.402652

9 October 2000 Optical emission diagnostics of glow discharge plasma for the carbon nitride growth process

Wei Yu, Shu-Fang Wang, Xiao-Wei Li, Lianshui Zhang, Guangsheng Fu

Proceedings Volume 4221, Optical Measurement and Nondestructive Testing: Techniques and Applications; (2000) https://doi.org/10.1117/12.402652
Event: Optics and Optoelectronic Inspection and Control: Techniques, Applications, and Instruments, 2000, Beijing, China

Abstract

In this paper Plasma diagnostics are performed during dc glow discharge plasma-enhanced chemical vapor deposition of carbon nitride thin films using optical emission spectroscopy. The influence of the experimental parameters such as percentage of H₂, discharge current and total gas pressure on the emission intensities of the excited species in the plasma is investigated. Based on these results, the excitation mechanism of these species is discussed to gain understanding of the influence of the experiment parameters on the deposition process.

Citation Download Citation

Wei Yu, Shu-Fang Wang, Xiao-Wei Li, Lianshui Zhang, and Guangsheng Fu "Optical emission diagnostics of glow discharge plasma for the carbon nitride growth process", Proc. SPIE 4221, Optical Measurement and Nondestructive Testing: Techniques and Applications, (9 October 2000); https://doi.org/10.1117/12.402652

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