Selection of pattern in slit diffraction measurement and its influence on measurement accuracy

Fuping Liang

doi:10.1117/12.402573

9 October 2000 Selection of pattern in slit diffraction measurement and its influence on measurement accuracy

Fuping Liang

Proceedings Volume 4221, Optical Measurement and Nondestructive Testing: Techniques and Applications; (2000) https://doi.org/10.1117/12.402573
Event: Optics and Optoelectronic Inspection and Control: Techniques, Applications, and Instruments, 2000, Beijing, China

Abstract

The serial parameters such as slit width, wire diameters and plate thickness can be measured by application of diffraction, and it can be derived to measure the variables of interval, displacement, strain, section and the others. The field distribution of slit diffraction are investigated, and the extreme values of slit diffraction are given step-by-step approach with computer. The influence of selecting the pattern and the level of the comparator for video frequency output of CCD/CCPD upon measurement accuracy are analyzed.

Citation Download Citation

Fuping Liang "Selection of pattern in slit diffraction measurement and its influence on measurement accuracy", Proc. SPIE 4221, Optical Measurement and Nondestructive Testing: Techniques and Applications, (9 October 2000); https://doi.org/10.1117/12.402573

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