Theoretical and experimental study of Cs 852-nm FADOF

Yong Bi; Yundong Zhang; Xiaoling Jia; Qi L. Wang; Zuguang Ma

doi:10.1117/12.401772

5 October 2000 Theoretical and experimental study of Cs 852-nm FADOF

Yong Bi, Yundong Zhang, Xiaoling Jia, Qi L. Wang, Zuguang Ma

Proceedings Volume 4223, Instruments for Optics and Optoelectronic Inspection and Control; (2000) https://doi.org/10.1117/12.401772
Event: Optics and Optoelectronic Inspection and Control: Techniques, Applications, and Instruments, 2000, Beijing, China

Abstract

In this paper, the theoretical model and experimental demonstration of Cs 852nm FADOF in weak and strong magnetic field are discussed. Whenthe FADOF system working under the weak field, the theoretical and experimental results are agreement with the previous repot. In the case of strong field, when performing condition is B equals 0.0883T, T equals 351K, the line-center operation is observed. The comparison between the theory and the experiment gives reasonably expected results.

Citation Download Citation

Yong Bi, Yundong Zhang, Xiaoling Jia, Qi L. Wang, and Zuguang Ma "Theoretical and experimental study of Cs 852-nm FADOF", Proc. SPIE 4223, Instruments for Optics and Optoelectronic Inspection and Control, (5 October 2000); https://doi.org/10.1117/12.401772

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