Overview of reticle enhancement technology software strategy

Alfred J. Reich; R. D. Jarvis; Steve Talent; Renee Carter

doi:10.1117/12.404842

20 October 2000 Overview of reticle enhancement technology software strategy

Alfred J. Reich, R. D. Jarvis, Steve Talent, Renee Carter

Proceedings Volume 4226, Microlithographic Techniques in Integrated Circuit Fabrication II; (2000) https://doi.org/10.1117/12.404842
Event: International Symposium on Microelectronics and Assembly, 2000, Singapore, Singapore

Abstract

Although RET software technology has made great advances in recent years, very little attention has been paid to how this technology can be put into reliable and efficient use in a production environment. To stimulate EDA suppliers to take up this task, a system for not only automating RET, but also for generalizing the automation of RET is described.

Citation Download Citation

Alfred J. Reich, R. D. Jarvis, Steve Talent, and Renee Carter "Overview of reticle enhancement technology software strategy", Proc. SPIE 4226, Microlithographic Techniques in Integrated Circuit Fabrication II, (20 October 2000); https://doi.org/10.1117/12.404842

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